Loyola University Chicago School of law is hosting the 2009 Patent Law Interview Program on Thursday, July 30 and Friday, July 31 in Chicago. This is a nationwide interview program that targets patent law employers, rising 2L and 3L students, and students in Intellectual Property LLM programs.Last year roughly 150 employers, 150 law schools, and 1,500 law students from across the country participated in the program. Students with undergraduate or graduate degrees in engineering or a technical science should consider registering for the program.
For more information on the program, please refer to the program website at http://www.luc.edu/law/career/Patent_Program_-_Stu.html.
Online student registration for this year’s Patent Law Interview Program will begin on Monday, February 23 and close on Thursday, March 12. Please direct any questions about the program to the Patent Program Liaison in our office, Jessie Howell Wallace at howellje@law.ufl.edu .